Innovative chemistry for your metals
This is an overview of our proven systems. Additionally we develop products for the special applications of our clients.
| System | Characterisation | Features | Application |
|---|---|---|---|
| Naburex® 135 | Well-balanced composition of inorganic salts | Removal of etching deposit which is formed during alkaline etching of high-alloyed aluminium | Dip 20 - 30 °C 6-10 % |
| Naburex® 138 | Stabilized oxidant, suitable in combination with used anodized sulphuric acid | Brightening of the surface decreases the COD in sewage | Dip 20 - 30 °C 1-5 % |
| Naburex® 139 | Stabilized oxidant, suitable in combination with used anodized sulphuric acid, accelerating effect | Brightening of the surface decreases the COD in sewage | Dip 20 - 30°C 5-15% |
NABU®, Nabuclean®, Nabuphor®, Nabural®, Naburex®, Nabutan® are registered trademarks of NABU Oberflächentechnik GmbH, Germany. E-CLPS ®, Tri-CLPS ® and Zirca-Sil ™ are registered trademarks of BULK Chemicals Inc., Pennsylvania, USA.
